Compact tabletop UV-ozone cleaners are useful for sample preparation at space-limited lab facilities.
 
Setcas UV Ozone Cleaners are highly published and widely used in industry, production and academics labs to UV clean semiconductor wafers, UV clean LCD surfaces during manufacturing, remove and strip photoresist, improve surface wettability, UV clean AFM probes / tips, UV Clean SEM & TEM samples, UV polymer activation, assembly / bonding of PDMS / glass microfluidic devices, UV clean glass and a host of other UV Ozone cleaning and oxidation applications.
 
Setcas UV Ozone Cleaners have proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm ultraviolet light. In the presence of oxygen, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.
 
UV Ozone Cleaner Common Materials:
UV Clean Glass
UV Clean Silicon
UV Clean Gallium Arsenide
UV Clean ITO
UV Clean Quartz
UV Clean Mica
UV Clean Sapphire
UV Oxidize Metals
UV Clean Ceramics
UV Activate Polymers and Crosslink Polymers
UV Strip Photo Resist / Photoresist
UV Clean Wafers
UV Clean Production Line LED displays
UV Clean Glass slides and Glass coverslips
UV Clean Gold surfaces
UV Clean Platinum surfaces
UV Activate PDMS for Microfluidic assembles
 
UV Ozone Cleaner Common Applications:
Atomically clean Semiconductor Silicon Wafers using UV Ozone.
Eliminate nasty acid and chemical bath cleaning methods that are dangerous for people and the environment
Make Hydrophobic surfaces more Hydrophilic
Fast & Simple method to clean AFM, SEM and TEM samples, surfaces and probes UV Ozone
Atomically clean glass sides and coverslips
Cell culture and cell adhesion surface preparation
Preparation for Force Spectroscopy studies
Semiconductor Surface UV Oxidation and Preparation
For manufacturing of LED displays
Cleaning sensitive Lenses and Optics
Increased Surface Wettability after UV Ozone cleaning
Enhance adhesion of paints, coatings, glues and adhesives
UV Ozone Cleaning Quartz and Ceramic Surfaces
Improved Thin Film Deposition Quality with UV Ozone
Ultraviolet (UV) Curing and crosslinking of polymers and adhesives
UV Surface Patterning
UV Etching and Surface UV Oxidation
An effective, non-destructive, non-vacuum alternative to plasma cleaning
UV Ozone Cleaner preparation for Alkanethiol, APTES, silanization and other surface chemistry
UV Ozone heat treatment
 
Product Features:
Material: The whole body is made of stainless steel, which is resistant to acid and alkali, corrosion, and beautiful.
Structure: Drawer type sample table, easy and convenient to take and place the substrate
Airway: Reserved air intake interface to enrich the cleaning type of equipment
Protection: Drawer opening and closing interlock with UV light to avoid UV damage
Timing: Button timer, digital countdown, intuitive
Operation: The cleaning process can be manually terminated at any time.
Accessories: Optional ozone neutralizer to avoid ozone damage
 
Specification:
Sample Size: Up to 160mm x 200mm
Cleaning band: 185nm and 254nm
3-5mm average light intensity from UV lamp: 28~32mW/cm2
Lamp: Double tube low pressure mercury lamp
Adjustable illumination distance: 5~30mm
Timer working range: 0~99min99s with automatic countdown function
Heating range (Optional): From room temperature to 200 ℃
 
Warranty Period: One year.

Mechanical index
Inlet and outlet ports: Intake port φ8mm, air outlet φ25mm
Equipment dimensions: 250mm (W) × 300mm (D) × 260mm (H)
Tray size: 160mm (W) × 200mm (D) × 5 ~ 30mm (H)
Product weight: 8 KG